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INNOVATION

Advanced Coating
Technology

High-performance surface engineering using advanced PVD and plasma-based coating systems.

Why PVD?

Physical Vapor Deposition (PVD) is more than a coating - it's a fundamental transformation of material surfaces, enabling tools and components to withstand environments that would destroy untreated metals.

15,000°C
Plasma Energy
1-5μm
Ultra-Thin Film
01

Extreme Hardness

1,500 – 3,500 HV

Staton coatings create a nanostructured ceramic layer that is significantly harder than the substrate, providing a diamond-like barrier against deformation and impact.

02

Wear Resistance

5x Tool Life Extension

By reducing adhesive and abrasive wear, PVD coatings dramatically extend the operational life of cutting tools, molds, and automotive components.

03

Low Friction

μ as low as 0.05

Ultra-smooth surfaces reduce heat generation and material pick-up, enabling higher machining speeds and improved surface finishes on the workpiece.

04

Thermal Stability

Up to 1,100°C

PVD films maintain their chemical and mechanical integrity at extreme temperatures, protecting the substrate during dry machining or high-speed operations.

Core Coating Technologies

Staton's proprietary PVD and plasma technologies deliver industry-leading performance across four core deposition methods, optimized for maximum tool life and surface integrity.

CORE TECHNOLOGY 01

Arc Evaporation

Cathodic Arc Deposition is a PVD process where a high current applied to a metallic target creates a cathodic spot at an extreme temperature of 15,000°C, instantly vaporizing target material. The arc produces highly ionized plasma (30–100% ionization) resulting in exceptional coating adhesion and density. Standard arc processes produce macroparticles that roughen the coating surface. Staton's proprietary fsARC® cathode uses a rapidly-adjusting electromagnetic field to split the arc and accelerate the arc spot in order to minimise macroparticles - producing smooth and homogeneous coatings while maintaining high hardness and adhesion.

Ionization: 30–100%
Deposition rate: 2–5 μm/hr
Adhesion: HF1–HF2
PVD cathodic arc evaporation technology process style="position:absolute; width:100%; height:100%; object-fit:cover; opacity: 0.7; z-index: 0; mix-blend-mode: screen;"> fsARC® Cathodic Arc
CORE TECHNOLOGY 02

Magnetron Sputtering

Magnetron Sputtering uses magnetically-confined plasma to bombard a target, ejecting atoms that deposit as a uniform, extremely smooth thin film. The magnetic field increases ionization efficiency near the target surface, enabling precise control of coating thickness to within nanometers. Staton's OCTOMAG series supports DC, MF (mid-frequency), and HiPIMS power modes within a single system - making it the most versatile platform for applications requiring ultra-smooth surfaces, low-temperature deposition, or biocompatible coatings for medical devices.

Surface roughness Ra: < 0.1 μm
Thickness control: ±5 nm
Max substrate temp: 200°C
Magnetron sputtering PVD coating technology process style="position:absolute; width:100%; height:100%; object-fit:cover; opacity: 0.8; z-index: 0;"> OCTOMAG Sputtering
CORE TECHNOLOGY 03

HiPIMS Plasma

High Power Impulse Magnetron Sputtering (HiPIMS) delivers ultra-short, ultra-high-power pulses (peak power density: 1–10 kW/cm²) to the target - generating a dense, highly ionized plasma (>50% ionization vs <5% in DC sputtering). This high ionization produces dramatically denser, harder coatings with superior adhesion at low substrate temperatures. HiPIMS is the technology of choice for coating micro-tools, medical implants, and precision components where surface finish, uniformity, and biocompatibility are non-negotiable.

Peak power: 1–10 kW/cm²
Ionization: >50%
Compatible with HITUS mode
High-power impulse magnetron sputtering (HiPIMS) plasma process style="position:absolute; width:100%; height:100%; object-fit:cover; opacity: 0.8; z-index: 0;"> HiPIMS Pulse Plasma
CORE TECHNOLOGY 04

PECVD Technology

Plasma-Enhanced Chemical Vapor Deposition (PECVD) uses plasma energy to activate chemical reactions at significantly lower temperatures than conventional CVD - typically 150–400°C vs 800–1,000°C. This makes PECVD ideal for depositing Diamond-Like Carbon (DLC) and ta-C coatings on heat-sensitive substrates including aluminium alloys, polymers, and pre-hardened steel tools. The resulting DLC coatings offer some of the lowest friction coefficients achievable (μ < 0.05) with extreme hardness up to 3,500 HV - ideal for machining non-ferrous materials and forming tools for aluminium parts.

Deposition temp: 150–400°C
Hardness: up to 3,500 HV
Friction μ: < 0.05
Plasma-enhanced chemical vapor deposition (PECVD) technology style="position:absolute; width:100%; height:100%; object-fit:cover; opacity: 0.8; z-index: 0;"> DLC / PECVD Carbon

Suppress the Macroparticles. Maximize the Speed.

While standard cathodic arc machines spray molten macroparticles that roughen surfaces and reduce tool life, Staton's fsARC® technology uses a system of magnetic fields to split and accelerate the cathodic arc spot - thereby minimising macroparticle formation, ensuring a homogeneous coating with high adhesion and hardness.

STANDARD ARC
Surface roughness Ra~0.8–1.5 μm
MacroparticlesPresent
Tool life multiplier1× baseline
STATON fsARC®
Surface roughness Ra~0.1–0.3 μm
MacroparticlesSuppressed
Tool life multiplierUp to 5×
Staton's fsARC® cathode uses a high-current magnetic oscillation system to split the cathodic arc - dramatically reducing macroparticle formation. Coatings produced with fsARC® consistently achieve Ra values comparable to HiPIMS magnetron sputtering, while maintaining the superior hardness and adhesion of cathodic arc deposition.

Magnetron Plasma
Technology (HiPIMS)

HiPIMS delivers ultra-short, ultra-high-power pulses generating plasma ionization exceeding 50% - vs less than 5% in conventional DC sputtering. The result: denser coatings, superior adhesion, and ultra-smooth surfaces at low substrate temperatures.

High Ionization
>50% vs <5% in DC mode
Superior Adhesion
HF1 scratch test rating
Ultra-Smooth
Ra < 0.1 μm surface finish
Precise Control
±5 nm thickness accuracy

Process Flow

[ 01 ]

Pre-Inspection

Dimensional check and surface condition assessment.

[ 02 ]

Stripping

Safe removal of existing PVD coatings from tools.

[ 03 ]

Ultrasonic Cleaning

Multi-stage bath to remove microscopic contaminants.

[ 04 ]

Chamber Loading

Mounting on planetary rotating fixtures for 360° coverage.

[ 05 ]

Plasma Etching

Argon ion bombardment for maximum coating adhesion.

[ 06 ]

PVD Deposition

Target vaporization via proprietary fsARC® or HiPIMS.

[ 07 ]

QC Inspection

Hardness, adhesion, and thickness certification.

All measurements shown are based on microscopic wear analysis performed under controlled machining conditions. Competitor identities are intentionally anonymized. Performance may vary depending on workpiece material, cutting parameters, and application environment.
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